NEW YORK (GenomeWeb News) – NanoInk today announced an agreement to license five new technologies from Northwestern University.
The technologies, which will be used in connection with tip-based lithography, are the Polymer Pen Lithography technology; block co-polymer assisted nanolithography; force feedback leveling of massively parallel polymer pen arrays; massively parallel hard-tip, soft-spring lithography; and gel pen lithography.
The Skokie, Ill.-based company said that it will leverage the technologies to expand the capabilities of its existing nanofabrication systems.
"We believe that these technologies, when combined with the capabilities of the NanoInk platform, have the potential to lead to significant developments in numerous fields, including large area nanofabrication, photonics, drug discovery, cell biology, and next-generation sequencing," Robert Janosky, the company's president and COO, said in a statement.
NanoInk did not disclose the terms of the deal.