IP Update: Recent Patents Awarded to the University of Pennsylvania; Intel; Affymetrix; and More | GenomeWeb

Shin-Etsu Chemical of Tokyo has received US Patent No. 8,053,179, "Method for manufacturing substrate for making microarray." The method includes the steps of: forming a resist film on a substrate using a chemically amplified, positive resist composition using a copolymer; patterning molecules in the resist film; forming a monomolecular film consisting of a silicon oxide chain on the substrate; and then removing the resist film.

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