Shin-Etsu Chemical of Tokyo has received US Patent No. 8,053,179, "Method for manufacturing substrate for making microarray." The method includes the steps of: forming a resist film on a substrate using a chemically amplified, positive resist composition using a copolymer; patterning molecules in the resist film; forming a monomolecular film consisting of a silicon oxide chain on the substrate; and then removing the resist film.

Get the full story with
GenomeWeb Premium

Only $95 for the
first 90 days*

A trial upgrade to GenomeWeb Premium gives you full site access, interest-based email alerts, access to archives, and more. Never miss another important industry story.

Try GenomeWeb Premium now.

Already a GenomeWeb Premium member? Login Now.
Or, See if your institution qualifies for premium access.

*Before your trial expires, we’ll put together a custom quote with your long-term premium options.

Not ready for premium?

Browse our free articles
You can still register for access to our free content.

In PLOS this week: new gene linked to ocular coloboma, new statistical model for interrogating gene expression networks, and more.

With a new collection, PLOS highlights negative results it has published.

A pair of researchers examines political leanings and views on genomics, finding more of a role for optimism and pessimism in people's views.

The genome of the carnivorous bladderwort is smaller than many other plant genomes, but it still holds on to important genes.