Shin-Etsu Chemical of Tokyo has received US Patent No. 8,053,179, "Method for manufacturing substrate for making microarray." The method includes the steps of: forming a resist film on a substrate using a chemically amplified, positive resist composition using a copolymer; patterning molecules in the resist film; forming a monomolecular film consisting of a silicon oxide chain on the substrate; and then removing the resist film.

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Oxford Nanopore Technologies is looking into dual listings in London and Hong Kong, according to the South China Morning Post.

The New York Times looks into medical research funding in the US and how the grant system might not be funding the best work.

US lawmakers proposed increasing the National Science Foundation budget, including its facilities account, Science reports.

In PNAS this week: effects of gene deletions on bacterial metabolic networks, genetic responses to sea star wasting disease, and more.

Jun
21
Sponsored by
Roche

This webinar will provide a detailed look at how a genomics lab implemented next-generation sequencing (NGS) liquid biopsy assays into its in-house clinical research program.