Optomec of Albuquerque, NM, has received US Patent No. 8,455,051, "Apparatuses and methods for maskless mesoscale material deposition." Using the claimed method, features can be deposited directly on a surface, with the line widths of these features ranging from the micron range up to a fraction of a millimeter. According to the patent, deposition and subsequent processing may be carried out under ambient conditions, eliminating the need for a vacuum atmosphere. The process may also be performed in an inert gas environment.