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Optomec Design of Albuquerque, NM, has received US Patent No. 7,485,345 “Apparatuses and methods for maskless mesoscale material deposition.” The patent claims apparatuses and processes for the maskless deposition of electronic and biological materials. The described process is capable of the direct deposition of features with linewidths varying from the micron range up to a fraction of a millimeter, and may be used to deposit features on substrates with damage thresholds near 100 degrees Celsius.

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Sponsored by
Lexogen

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Oct
25
Sponsored by
Roche

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