Canon Kabushiki Kaisha, Affymetrix, Seiko Epson, Vir, The Iowa State University Research Foundation | GenomeWeb

Canon Kabushiki Kaisha of Tokyo received US Patent No. 6,737,238, “Substrate measuring method and device.” The patent covers a method of measuring a sample on a substrate that makes it possible to simplify the control and construction of a measuring device, shorten the measuring period, make the measuring conditions constant, and improve the positional accuracy. The method is performed by forming a circular orbit of detection areas.

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