Affymetrix of Santa Clara, Calif., has received US Patent No. 6,480,324 “Methods involving direct write optical lithography.” The patent is for an improved optical photolithography system and method that provides predetermined light patterns generated by a direct write system without the use of photomasks. The system works on the surface of a substrate (e.g., a wafer) by using a computer controlled component for dynamically generating the predetermined light pattern, e.g., a spatial light modulator. Image patterns are stored in a computer and through electronic control directly illuminate the wafer to define a portion of the polymer array, rather than being defined by a pattern on a photomask.
NextGen Sciences of Huntingdon, Cambridgeshire, UK, was awarded UK Patent No. GB 237 0039, “Producing Protein Arrays and Fusion Proteins for use therein,” the company said. The patent covers a peptide-based fusion tag that can be biotinylated in vivo or in vitro at a single lysine residue within the tag sequence for the use in the production of protein chips. This enables the proteins to attached to streptavidin-coated protein biochip substrates in a predictable manner.