Affymetrix, NextGen Sciences

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Affymetrix of Santa Clara, Calif., has received US Patent No. 6,480,324 “Methods involving direct write optical lithography.” The patent is for an improved optical photolithography system and method that provides predetermined light patterns generated by a direct write system without the use of photomasks. The system works on the surface of a substrate (e.g., a wafer) by using a computer controlled component for dynamically generating the predetermined light pattern, e.g., a spatial light modulator.

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