Affymetrix, Agilent Technologies, Agilent, Eastman Kodak, Enzo Life Sciences, California Institute of Technology | GenomeWeb

Affymetrix of Santa Clara, Calif., has received US Patent No. 6,949,638, "Photolithographic method and system for efficient mask usage in manufacturing DNA arrays." The patent claims systems, methods, and products for synthesizing probe arrays of polymers. According to the patent, a mask is used that includes reticle areas, each of which includes a number of reticles associated with a same synthesis area on a substrate.

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