By a GenomeWeb staff reporter

NEW YORK (GenomeWeb News) – NanoInk today announced an agreement to license five new technologies from Northwestern University.

The technologies, which will be used in connection with tip-based lithography, are the Polymer Pen Lithography technology; block co-polymer assisted nanolithography; force feedback leveling of massively parallel polymer pen arrays; massively parallel hard-tip, soft-spring lithography; and gel pen lithography.

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